Microstructure and properties of a silicon coating deposited on a titanium nickelide substrate using molecular-beam epitaxy equipment

Эндаумент фонд ТГУ!
Впиши своё имя в историю университета
- Сделать пожертвование -

Add to "Quick Collection"

Description	Size	Format
Microstructure and properties of a silicon coating deposited on a titanium nickelide substrate using molecular-beam epitaxy equipment	894 KB	Adobe Acrobat PDF	Read	Download
DOI Доступ к ресурсу на сайте издателя			10.1088/1742-6596/1954/1/012024

Title: Microstructure and properties of a silicon coating deposited on a titanium nickelide substrate using molecular-beam epitaxy equipment
Creator: Krukovskii, K. V.
|
Kashin, Oleg A.
|
Luchin, A. V.
|
Kokhanenko, Andrey P.
|
Dirko, Vladimir V.
|
Lozovoy, Kirill A.
|
Kashina, O. N.
|
Bobrov, D. I.
Date: 2021
DOI: 10.1088/1742-6596/1954/1/012024
Description: The microstructure and properties of a silicon coating on a titanium nickelide substrate were studied to assess the possibility of using such a coating to improve the biocompatibility of medical implants. The silicon coating with thickness of 4.0±0.5 microns was applied to the TiNi substrate on a molecular beam epitaxy unit. The coating had a submicrocrystalline structure with a crystallite size of 0.1...0.2 microns, a developed surface, and high crack resistance.

Relationships: Show Relationship Browser for this Object
collection(s): Радиофизический факультет
Identifier: смотреть в электронном каталоге НБ ТГУ
Type: статьи в журналах
Source: Journal of Physics: Conference Series. 2021. Vol. 1954. P. 012024 (1-4)
Language: eng

Created: 15-09-2022

1310 Visitors

1196 Hits

128 Downloads

Радиофизический факультет Microstructure and properties of a silicon coating deposited on a titanium nickelide substrate using molecular-beam epitaxy equipment